3. Vacuum deposition by reactive sputtering applications
“Reactive sputtering is a vacuum deposition technique and is used for applying coatings for anti-reflection, hardening, anti-wear, anti-corrosion, etc. Mass flow controllers play a key role in this process for the supply of gases.
We discovered that ‘fast response’ is an important feature of flow controllers in this deposition technique. The new gas flow controller is equipped with a sensor which can react very fast on setpoint changes (within 150 milliseconds). We learned that reactive sputtering applications can benefit from the large dynamic flow range, which makes it possible to control gas flows from 0,5 mln/min up to 20 ln/min. Check out the application note to learn more about the flow instruments suitable for this application.”